Journal of New Technology and Materials
Volume 2, Numéro 1, Pages 17-21
2012-06-25
The Electrochemical Nucleation And Properties Of The Co-cu Alloys Thin Films Deposited On Fto Substrate
Authors : Mentar L. . Azizi A. .
Abstract
In this study, the properties of Co-Cu alloys thin films prepared by the electrodeposition method from a sulfate bath under potentiostatic conditions on a fluorine-doped tin oxide (FTO)-coated conducting glass substrate have been investigated. The electrochemical characteristics of granular alloys were studied by using cyclic voltammetry (CV) and chronoamperometry (CA) techniques. The structural behaviors of the deposits have been determined by X-ray diffraction (XRD) measurements. The magnetic properties were investigated by alternating gradient force magnetometer (AGFM) technique. The effect of deposition potential on the electrodeposition process, phase structure and magnetic behaviors has been studied. CV studies revealed that the potential of Co dissolution depends on experimental parameters such as presence of Cu ions and cathodic limit. X-ray diffraction patterns of the Co-Cu alloys thin films exhibit an fcc and hcp phases, with peaks quite close to those of the Co phase (fcc and hcp). Magnetic properties such as coercivity and saturation magnetization showed strong dependence on the crystallite size and consequently the deposition potentials.
Keywords
electrodeposition; Co-Cu alloys; structure; magnetic
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