Journal of New Technology and Materials
Volume 11, Numéro 2, Pages 48-52
2021-12-20

Zinc Oxide Antireflection Thin-film: Spin Coater Parameters Effects

Authors : Guernazi Daoud . Kail Fatiha . Roura Grabulosa Pere . Mourad Lilia . Chahed Larbi .

Abstract

Zinc oxide (ZnO) is one of the commonly used materials in antireflective coating (ARC) due to its optical, physical, and chemical properties. In order to enhance optical transmittance, an ARC is essential. Refractive index and film thickness are the key parameters to get an efficient ARC. The aim of this work is to study deposition parameters’ effects on thickness evolution and film quality. Spin-coated ZnO film thickness was measured and controlled according to revolutions per minute (rpm) and spin time (t). For this purpose, a sol-gel derived film containing dihydrate Zinc Acetate (ZAD) and ethanolamine was used to be spin-coated on a glass substrate. Thermogravimetric analysis (TGA) was carried out in order to study the film thermal behavior and was followed by X-Ray Diffraction (XRD) measurement in order to confirm the crystallization of ZnO. The film thickness was deduced from its mass measured by a microbalance and its’ centrifugal spread over the substrate was checked by an optical microscope. By optimizing the deposition parameters, good film spread was obtained up to 4000 rpm with a spin time of 90 seconds at least. We found that the rpm affects strongly film thickness, in contrast to the spin time which affects the film spread.

Keywords

Antireflective coating ; Zinc oxide ; Spin coating ; Film thickness ; Spin time